Precise, high-resolution laser patterning of glass materials is still a challenging task. As glass is transparent in the visible and the near UV spectral range, for the ablative structuring of glass IR or deep-UV lasers are applied. As the achievable resolution scales with the wavelength, IR light does not provide the spatial resolution required for µm- and sub-µm-patterning. Hence, lasers emitting in the deep-UV are preferentially used for fast and high-resolution patterning of glass. While some lead-containing glasses exhibit sufficient absorption at 248 nm, most standard silicate glasses require a laser wavelength below 200 nm for efficient absorption. The ArF-excimer laser emitting at 193 nm is optimally suited to obtain controlled, crack free patterns with high resolution. At this wavelength, surface relief gratings in doped and pure glass have already been successfully fabricated. Such periodic patterns have a number of applications, e.g. for surface functionalization or diffractive marking.
M. Wiesner, J. Ihlemann:
High resolution patterning of sapphire by F2-laser ablation Applied Physics A 103, 51 (2011)
R. Karstens, A. Gödecke, A. Prießner, J. Ihlemann:
Fabrication of 250-nm-hole arrays in glass and fused silica by UV laser ablation Optics and Laser Technology 83, 16 (2016)
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Laser-Laboratorium Göttingen e.V. (LLG)
Head of the Department
Dr. Peter Simon
"Short Pulses / Nanostructures"
Contact person for
Nano Structure Technology:
Dr. Jürgen Ihlemann