Laser-plasma source

By focusing an intense Nd:YAG laser (1064 nm, 700 mJ, 6 ns) into a pulsed gas target (Xenon, Oxygen) an EUV plasma is ignited. The source delivers pulse energies of about 4 mJ at 13.5 nm at repetition rates from 1...10 Hz.

One of the most distinct features is the compact arrangement allowing EUV experiments within laboratory environment. Optimized nozzle geometries lead to conversion efficiencies of up to
0.45 % (cf. also parameters in table 1). 

Wavelength (Xe):2-40 nm
Plasma diameter:300 µm
Pulse duration:6 ns
Repetition rate:1…10 Hz
Conversion efficiency (Xe):0,45 %
EUV-Photons/pulse:2,4×1014
Pulse energy:4,0 mJ(4PI sr, 2 %BW)


Further Advantages are:

  • Flexible choice and continuous supply of target material
  • Low amount of dbris
  • Low gas consumption

 

Further information:

Productflyer Table-top source (PDF)

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Laser-Laboratorium Göttingen e.V. (LLG)

Contact person:

Head of department
Dr. Klaus Mann
"Optics / Short Wavelengths"

Tel.: +49(0)551/5035-41
FAX: +49(0)551/5035-99
kmann(at)llg-ev.de