EUV optics

For the production of high EUV energy densities a modified Schwarzschild objective for 13.5 nm radiation has been developed within the BMBF project KOMPASS ("Kompakte Strahlquelle hoher Brillanz für den weichen Röntgen-Spektralbereich"). It consists of two spherical mirrors (the substrate is ULE glass) which were each given a reflectivity of almost 70% using a Mo/Si multilayer-coating (Fraunhofer IOF). The aperture is 0.44, the magnification is 0.1. The diameter of the resulting EUV focus is < 30 µm at an energy density of about 100 mJ/cm2.

Magnification (M)0.102
Spot size~ 30 µm
NA0.44
Acceptance angle (Ω)5.33 msr
SubstratesULE glass
Reflectivity of Mo/Si multi-layers (R)> 65 % (per mirror / IOF)

 

The Mo/Si multilayer coating allows the Schwarzschild objective to reflect light in a narrow range at 13.5 nm. A broadband beam guidance is possible by means of total reflection at grazing angles. In the scope of the InnoNet project SpeXUV, a Kirkpatrick-Baez configuration was designed (cf. Fig. 2) to be used as a broadband condensator in a spectral photometer in the range 10…20 nm (specifications cf. Table 2).

Resolution< 10 µm (1:1-imaging)
NA0.007
Transmission (twofold reflection) > 65 % (> 81 % per mirror) 

 

Further information:

Product flyer „EUV optics“ (PDF) 

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Laser-Laboratorium Göttingen e.V. (LLG)

Contact person:

Head of department
Dr. Klaus Mann
"Optics / Short Wavelengths"

Tel.: +49(0)551/5035-41
FAX: +49(0)551/5035-99
kmann(at)llg-ev.de