Wechselwirkung mit Materie
An EUV beam focussing system as presented in the EUV-Optics section was used to investigate the interaction of pulsed soft X-ray radiation with matter for high resolution and direct structuring. This included the generation of color centers in LiF, direct photo-etching of polymers (e.g. PMMA) as well as the determination of the sensitivity of photoresists in the EUV range.
F. Barkusky, C. Peth, K. Mann, T. Feigl, N. Kaiser:
"Formation and Direct Writing of Color Centers in LiF using a Laser-Induced Extreme Ultraviolet Plasma in Combination With a Schwarzschild Objective", Rev. Sci. Instr., 76, 105102 (2005)
F. Barkusky, C. Peth, A. Bayer, K. Mann:
"Direct Photo-Etching of PMMA Using Focused Extreme Ultraviolet Radiation From a Table-top Laser-Induced Plasma Source", J. Appl. Phys., 101, 124908 (2007)
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