Phase masks and dielectric masks

Phase masks affect only the phase and not the amplitude of the transmitted light. Thus they offer low-loss operation compared to amplitude masks. Customized UV-transparent phase masks from SiO2 are fabricated by laser ablation according to a patented process. Especially masks with medium feature sizes ranging from 10 µm to a few 100 µm are ideally producible with this method. They can be used e.g. as diffractive beam splitters or projection masks for demagnifying imaging. The phase masks are optimized for the specific application wavelength, which can be in the range from the deep UV to the near infrared.


Dielectric masks are patterned reflective dielectric layer systems on transparent substrates. As such they are amplitude masks, which consist of areas with different transmission, in the extreme case 0 and 1. Customized masks can be fabricated by ablative structuring of dielectric layer stacks. Because of their high damage threshold compared to conventional chrome masks, they are applied mainly in high power applications (material processing).


Further information:

Link zu Flyer:
Fused silica phase masks


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Laser-Laboratorium Göttingen e.V. (LLG)

Contact person

Head of the Department
Dr. Peter Simon
"Short Pulses / Nanostructures"

Tel.: +49(0)551/5035-21
FAX: +49(0)551/5035-99

Contact person for
Nano Structure Technology:

Dr. Jürgen Ihlemann
Tel.: +49(0)551/5035-44
FAX: +49(0)551/5035-99