The Optics / Short Wavelengths department is concerned with the characterization of laser light sources as well as high quality optics for beam steering and shaping. One focus is put on the deep UV wavelengths (193 nm, 248 nm) relevant for semiconductor microlithography; all other laser relevant wavelengths are also available.
In order to characterize quality and radiation stability of optical components, e.g. absorption, thermal lensing, damage thresholds and long-term degradation we operate several measuring instruments. Furthermore, propagation and coherence properties of laser radiation are measured with high-resolution wavefront sensors.
Moreover, compact laser-driven plasma sources are developed in order to generate extreme ultraviolet (EUV) radiation and soft x-rays being used for several metrological applications such as absorption spectroscopy (NEXFAS), reflectometry and microscopy within the ‘water window’ (λ = 2.2 – 4.4 nm). In addition, stability and damage threshold measurements are conducted for EUV relevant materials and sensors at λ = 13.5 nm using appropriate beam shaping optics.
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