Wechselwirkung mit Materie

An EUV beam focussing system as presented in the EUV-Optics section was used to investigate the interaction of pulsed soft X-ray radiation with matter for high resolution and direct structuring. This included the generation of color centers in LiF, direct photo-etching of polymers (e.g. PMMA) as well as the determination of the sensitivity of photoresists in the EUV range.


Further information:

F. Barkusky, C. Peth, K. Mann, T. Feigl, N. Kaiser:
"Formation and Direct Writing of Color Centers in LiF using a Laser-Induced Extreme Ultraviolet Plasma in Combination With a Schwarzschild Objective", Rev. Sci. Instr., 76, 105102 (2005) 

F. Barkusky, C. Peth, A. Bayer, K. Mann: 
"Direct Photo-Etching of PMMA Using Focused Extreme Ultraviolet Radiation From a Table-top Laser-Induced Plasma Source", J. Appl. Phys., 101, 124908 (2007)


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Laser-Laboratorium Göttingen e.V. (LLG)

Contact person:

Head of department
Dr. Klaus Mann
"Optics / Short Wavelengths"

Tel.: +49(0)551/5035-41
FAX: +49(0)551/5035-99