EUV/XUV Laser-plasma Source

By focusing an intense Nd:YAG laser (1064 nm, 700 mJ, 6 ns) into a pulsed gas target (Xenon, Oxygen) an EUV plasma is ignited. The source delivers pulse energies of about 4 mJ at 13.5 nm at repetition rates from 1...10 Hz.

One of the most distinct features is the compact arrangement allowing EUV experiments within laboratory environment. Optimized nozzle geometries lead to conversion efficiencies of up to
0.45 % (cf. also parameters in table 1).

Wavelength (Xe):	2…40 nm
Plasma diameter:	300 µm
Pulse duration:	6 ns
Repetition rate:	1…10 Hz
Conversion efficiency (Xe):	0,45 %
EUV-Photons/pulse:	2,4×10^14
Pulse energy:	4,0 mJ(4PI sr, 2 %BW)

Table 1: Performance of tabletop EUV source

Advantages:

Compact setup
Continuous supply of target material
Low amount of debris
Low gas consumption

: Left: Tabletop EUV source and pinhole camera image of an EUV plasma (center); right: source spektra for different target materials (below: water window, above: EUV range).