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Departments > Optics / Short Wavelengths > EUV Radiation | ![]() |
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EUV OpticsFor the production of high EUV energy densities a modified Schwarzschild objective for 13.5 nm radiation has been developed within the BMBF project KOMPASS ("Kompakte Strahlquelle hoher Brillanz für den weichen Röntgen-Spektralbereich"). A Schwarzschild objective was developed in the scope of a cooperative project KOMPASS („Kompakte Strahlquelle hoher Brillanz für den weichen Röntgen-Spektralbereich“) of the German Ministry of Research. It consists of two spheric mirrors (the substrate is ULE glass) which were each given a reflectivity of almost 70% using a Mo/Si multilayer-coating (Fraunhofer IOF). The aperture is 0.4, the magnification is 0.1. The diameter of the resulting EUV focus is < 30 µm at an energy density of ~ 100 mJ/cm2 (cf. Table 1).
Table 1: Charakteristics of the EUV Schwarzschild-Objektive
The Mo/Si multilayer coating allows the Schwarzschild objective to reflect light in a narrow range at 13.5 nm. A broadband beam guidance is possible by means of total reflection at grazing angles. In the scope of the InnoNet project SpeXUV, a Kirkpatrick-Baez configuration was designed (cf. Fig. 2) to be used as a broadband condensator in a spectral photometer in the range 10…20 nm (specifications cf. Table 2).
Table 2: Specifications of the Kirkpatrick-Baez condensor
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Contact: Dr. Armin Bayer Dr. Klaus Mann |
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