Department "Optics / Short Wavelengths"

The Optics / Short Wavelengths department of the Laser-Laboratorium is concerned with the characterization of laser light sources as well as high quality optics for beam steering and shaping. The main focus is put on the deep UV wavelengths (193 nm, 248 nm) relevant for semiconductor microlithography. In addition compact laser-based EUV-/XUV sources for metrology applications as well as fundamental research are being developed.

Main topics:

• Optics characterization
• Beam propagation
• EUV radiation